i line, g line용 Negative Type Photoresist 가교제
상품명 구조식 주요용도 주요물질의 CAS No.
MW-30M i line, g line용
Negative Type Photoresist 가교제
68002-20-0
MW-390  
MW-100LM  
MX-750LM  
MX-270 KrF, ArF Excimer Laser용
Negative Type Photoresist 가교제
17464-88-9
MX-280  
MX-290  

 

PAG(산발생제) Photoresist
상품명 구조식 주요용도 주요물질의 CAS No.
IBPF
Bis(4-t-butylphenyl)iodonium
hexafluorophosphate
Excimer Laser  
IBCF
Bis(4-t-butylphenyl)iodonium
trifluoromethansulfonate
 
TS-01
Tris(4-methylphenyl) sulfonium
trifluoromethansulfonate
 
TS-91
Tris(4-methylphenyl)
sulfonium
hexafluorophosphate
 
TFE-Triazine
2-[2-(Furan-2-yl)ethenyl]
-4,6-bis(trichloromethyl)
-s-triazine
i line, g line  
TME-Triazine
2-[2-(5-Methylfuran-2-yl)
ethenyl]-4,6-bis
(trichloromethyl)-s-triazine
 
MP-Triazine
2-(Methoxyphenyl)
-4,6-bis(trichloromethyl)
-s-triazine
 
Dimethoxy Triazine
2-[2-(3,4-Dimethoxyphenyl)
ethenyl]-4,6-bis
(trichloromethyl)-s-triazine
 

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